Suitable for Class A/B or ISO Class 5-8 environments

Validated sterile wipes with guaranteed endotoxin levels <20 EU/wipe

• ES purification mask is made of high temperature treated polymer dust-free cloth.

• Specially made for clean environment, low dust generation, comfortable to wear, no peculiar smell.

Suitable for Class A/B or ISO Class 5-8 environments

Validated sterile wipes with guaranteed endotoxin levels <20 EU/wipe

Knitting with polyester or nylon yarns that have been specially covered.

The gloves are lightweight, fit the hand well, and are comfortable to wear, ensuring flexible operation and avoiding excessive hand fatigue

Fingertips and palms can be treated with PU coating to make them non-slip and wear-resistant

Great for PC building.

Conductive resin is added to the PU coating to make it have an excellent antistatic effect.

Fingertip PU coated non-slip treatment.

Made of 100% natural latex by special process

Can be used in dust-free environment, with anti-static function

There are cut-out models, sulfur-free models, anti-slip models, anti-static models, a variety of styles to choose from

Made of high-quality natural latex, together with other additives, refined and processed by a special powder-free process

The product is non-toxic and harmless

Good pulling force, good adhesion, comfortable wearing, flexible use

Good oil resistance, abrasion resistance and heat resistance

Does not contain protein, has no allergic reaction to human skin, is non-toxic, harmless, durable, and has good adhesion

The gloves are made of polyester fiber and conductive fiber, which has excellent anti-static performance

Optional 4mm, 5mm or 10mm between conductive fibers, the fabric is made of synthetic long fibers, which does not emit dust itself

The palm can be treated with PVC glue or PU coating, so that it has good wear resistance and antistatic performance

Non-toxic, free of microorganisms, free of impurities, and free of penetration

Wearing flexibility and good tactile feel

Allergen-free, powder-free, low dust generation and good chemical resistance

Dynamic dust generation (≥0.5μm)≤500ea/ft3

Surface resistance: 10e5~10e9

Dynamic Dust Generation (≥0.5μm)≤500ea/ft3

Surface Resistance: 10e5~10e9